The aim of this paper is to study the properties of copper oxide thin films prepared by electrolysis method and deposited on glass substrates by drop-casting method at different annealing temperatures. Copper oxide colloidal was successfully prepared by electrolysis method. The X-ray diffraction confirms the polycrystalline structure of the films. Atomic force microscopy shows that the increase in the annealing temperature improves the surface morphology, increases the grain size and removes the cracks. The best optical transmittance was for the film annealed at 200 ºC. The bandgap decreases from 3.35 eV to 3.15 eV as a result of increasing the annealing temperature. The wide bandgap that obtained in this study is due to quantum size effect.
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